4132208
9780521018005
Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry.Hitchon, W. N. G. is the author of 'Plasma Processes for Semiconductor Fabrication', published 0018 under ISBN 9780521018005 and ISBN 0521018005.
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