The Chemistry of Metal CVD

T. Kodas, M. Hampden-Smith The Chemistry of Metal CVD This is the first handbook on chemical vapor deposition (CVD) that focuses on the deposition of metallic coatings, an important process in electronics, corrosion protection, and finishing technologies. It offers a thorough, up-to-date coverage of the chemistry behind the CVD of metals, including the rationale for materials selection and compatibility. Contributions by leading scientists cover the deposition of metals, emphasizing aluminum, tungsten, gold, silver, platinum, palladium, nickel, copper, and other transition metals. The topics discussed include: synthesis and properties of the precursors, growth processes, purity, quality, morphology and adhesion of the resulting films as well as laser-, plasma- and ion -assisted deposition methods. The final chapter is a valuable summary and provides critical insight into which precursors, precursor delivery systems, and reactors to choose for different deposition behavior and how to interpret information obtained from CVD processes. With well over 1,000 references, this handbook is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal-coating processes and technologies.Kodas, Toivo is the author of 'The Chemistry of Metal CVD', published 1994 under ISBN 9783527290710 and ISBN 3527290710.