Substrate Engineering--Paving the Way to Epitaxy Symposium Held November 29-December 3, 1999, Boston, Massachusetts, U.S.A

Epitaxial growth has always been a marriage of convenience between film and substrate. In the simplest case, both film and substrate are the same material, providing a perfect homoepitaxial match between relevant mechanical and chemical properties. More and more frequently, however, it is impractical to use the same material for both film and substrate because it is not available as large single crystals, it is prohibitively expensive, or its properties are ill-suited for the intended application. To meet these challenges, many strategies have been pursued to achieve highly oriented or single-crystal thin films via epitaxy. Therefore, compounds previously considered useless have now become novel substrates. Crystalline films have been mechanically bonded to other materials to form composite substrate. Crystals have been cut and rewelded, patterned and regrown, buffer layered and repolished. Each strategy has met with fundamental challenges including lattice mismatch, chemical incompatibility, differences in thermal expansion, and structural dissimilarity. This volume focuses on recent developments in novel substrate engineering which enable improved epitaxy. In particular, the volume brings together groups developing and improving novel substrates with those using them for film growth and device fabrication.Norton, D. P. is the author of 'Substrate Engineering--Paving the Way to Epitaxy Symposium Held November 29-December 3, 1999, Boston, Massachusetts, U.S.A', published 2000 under ISBN 9781558994959 and ISBN 1558994955.