1406950
9780841227217
Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists.Thompson, Larry F. is the author of 'Polymers for Microelectronics Resists and Dielectrics' with ISBN 9780841227217 and ISBN 0841227217.
[read more]