1392701
9780124693708
Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.Manos, Dennis M. is the author of 'Plasma Etching An Introduction' with ISBN 9780124693708 and ISBN 0124693709.
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