Photomask Fabrication Technology

bull; bull;Fabrication processing methods bull;Quality control parameters bull;Resolution enhancement techniques bull;Defect reduction Photomask fabrication technologies and applications A must-have guide for engineers developing photomask manufacturing processes, Photomask Fabrication Technology fully explains the technology behind industrial photomask production, focusing on practical applications. Readers will find complete details on fundamental principles, industrial production flows, technological evolution and development, and state-of-the-art advancements. Includes detailed coverage of: bull; bull;Data preparation methods and issues bull;Pattern formation and transfer technology bull;Metrology and finishing methods bull;Resolution enhancement applications bull;Next-generation lithography trends Gain the expertise required for modern photomask manufacturing with this definitive resource: Data preparation and design * Pattern generation * Pattern transfer * Photomask metrology * Defect control and finishing * Inspection, repair, and cleaning * Resolution enhancement techniques * Wafer fabrication issues * Future developmentsEynon, Benjamin G. is the author of 'Photomask Fabrication Technology', published 2005 under ISBN 9780071445634 and ISBN 0071445633.