New Methods, Mechanics and Models of Vapor Deposition Symposium Held April 24-268, 2000, San Francisco, California, U.S.A

Vapor deposition is increasingly used to synthesize thin films and coatings that underpin numerous technologies from microelectronics to aircraft engines. As the structural and compositional complexity of these vapor-deposited materials increases, many new methods of vapor deposition have been developed. The design of these new processes and materials are increasingly founded upon a detailed scientific understanding of the atomic-scale mechanisms of growth. Today, the community is beginning to rely more heavily upon the use of models that link these mechanisms to the growth conditions. This volume explores these interlinked issues and their applications in micro- and magnetoelectronics, hard coatings, photo-voltaics, high-Tc thin films and the group-three nitrides. The volume is organized so that many of the new methods of vapor deposition are introduced first. This is followed by a series of papers on the mechanisms of vapor deposition including the use of "in situ characterization techniquesto observe them. The volume finishes with papers exploring the application of modeling techniques to simulate the growth of vapor-deposited structures. The use of "in situ sensors to validate simulations is also widely covered. Together, the papers in this volume provide a detailed view of the state of the art and should be beneficial to all who are engaged in its research and development.Wadley, H. N. G. is the author of 'New Methods, Mechanics and Models of Vapor Deposition Symposium Held April 24-268, 2000, San Francisco, California, U.S.A' with ISBN 9781558995246 and ISBN 1558995242.