Glow Discharge Processes: Sputtering and Plasma Etching

Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.Brian Chapman is the author of 'Glow Discharge Processes: Sputtering and Plasma Etching', published 1980 under ISBN 9780471078289 and ISBN 047107828X.