Ferroelectric Thin Films XII : 2003 MRS Fall Meeting Symposium Proceedings

This volume offers the latest scientific and technological information on ferroelectric thin films from an international mix of academia, industry and government organizations. It comes at a time when there is a new surge of interest in both the fundamentals of ferroelectric films. as well as new applications. The volume highlights the current state of the art and provides insight into the emerging trends of this exciting technology. Presentations focus on the expanding scientific understanding of, and significant progress in, ferroelectric device technology, along with continuing developments in novel oxide materials-their properties, characterization techniques, and the fundamental under-standing of ferroelectricity in thin films. Advances presented on high-density ferroelectric nonvolatile memories (FeRAMs) include issues of materials integration, metal oxide electrodes utilization, the effect of stress on capacitors, and long-term reliability. Impressive developments in the integration of ferroelectric thin films on silicon are addressed in a joint section with Symposium E, Fundamentals of Novel Oxide/Semiconductor Interfaces. Special emphasis is placed on heterostructures of silicon substrates and oxide thin films, and on the thermal stability of these interfaces. The use of high-permittivity materials for a variety of capacitor applications, with particular interest in decoupling capacitors, as well as the integration of such films into high-frequency applications, e.g., RF voltage-tunable devices, is also featured. Topics include: fundamentals of ferroelectric thin films-emphasis on strain; fundamentals of ferroelectric thin films-emphasis on characterization and domains; oxide films processing-emphasis on CVD and pattern formation; ferroelectric films-processing and integration; dielectric films applications-low frequency to microwave; ferroelectric films for memories-materials and domains; gate dielectrics and functional oxides in silicon; and piezoelectric, optical and pyroelectric applications.Hoffmann-Eifert, Susanne is the author of 'Ferroelectric Thin Films XII : 2003 MRS Fall Meeting Symposium Proceedings', published 2009 under ISBN 9781558997226 and ISBN 1558997229.