Chemical Vapor Deposition of Tungsten and Tungsten Silicides for Vlsi/Ulsi Applications

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments and applications are described.Schmitz, John E. J. is the author of 'Chemical Vapor Deposition of Tungsten and Tungsten Silicides for Vlsi/Ulsi Applications' with ISBN 9780815512882 and ISBN 0815512880.