Chemical Processing of Dielectrics, Insulators, and Electronic Ceramics Symposium Nn, Held November 29-December 1, 1999, Boston, Massachusetts, U.S.A

This volume focuses on the creative use of chemistry in the fabrication of a variety of oxide and nonoxide materials which are likely to play a crucial role in the development of the next generation of microelectronics devices. The range of papers clearly demonstrates the multidisciplinary nature of the field, involving inorganic precursor chemistry, gas-phase and solid-state chemistry, materials science, chemical physics and chemical engineering. A number of particularly "hot" areas of research are featured and include the deposition of high-k dielectric gate oxides, ferroelectric oxide films for infrared and memory applications, low-k dielectrics, TiN and TaN diffusion barriers, and new precursors for III-V nitrides. Throughout, the emphasis is on chemical methods for the controlled deposition of thin films, for which chemical vapor deposition (CVD) has proven to be a useful and versatile technique. A particularly noteworthy development is the use of liquid-inlection MOCVD for the depositionof oxide multilayers and superlattices. Therefore, despite the increased use of CVD, solution deposition techniques such as sol-gel, metal-organic decomposition (MOD), hydrothermal processing, and chemical bath techniques are also prominently featured. Topics include: CVD of oxide ceramics; CVD of nonoxide ceramics; solution deposition of electronic ceramics; alternative chemical processing methods and characterization of electronic ceramics.Jones, A. C. is the author of 'Chemical Processing of Dielectrics, Insulators, and Electronic Ceramics Symposium Nn, Held November 29-December 1, 1999, Boston, Massachusetts, U.S.A' with ISBN 9781558995147 and ISBN 1558995145.